Neova Advanced HA

A cellular reinforcing system with specialized low-molecular-weight Hyaluronic Acids and DNA repair deals directly with moisture deficits stabilizes cell function, and unwinds acquired photodamage before it can become permanent.

KEY INGREDIENTS:

• LMW Hydrolyzed Hyaluronic Acid binds to collagen on one side and links to water molecules on the other, giving skin its bounce. When there is damage, it regulates inflammation levels to reduce cell stress.
• Ceramides protect the skin’s barrier and resist irritating aggressors.
• DNA Repair Enzymes Photolysomes, Mitosomes, Endosomes recognize the most common form of oxidative damage to DNA and eliminate 90% of it in 2 hours and have been shown to reduce UV-induced DNA damage by 45% after a single exposure.

Water (Aqua), Hamamelis Virginiana (Witch Hazel) Water, Propylene Glycol, Glycerin, Panthenol, Xylitylglucoside, Anhydroxylitol, Peg-12 Dimethicone, Polysorbate 20, Arabidopsis Thaliana Extract, Micrococcus Lysate, Plankton Extract, Hydrolyzed Hyaluronic Acid, Ginkgo Biloba Leaf Extract, Ammonium Acryloyldimethyltaurate/VP Copolymer, Phenoxyethanol, Butylene Glycol, Alcohol, Xylitol, Ethylhexylglycerin, Lecithin, Sodium Lauroyl Lactylate, Carnosine, Ceramide NP, Ceramide AP, Phytosphingosine, Cholesterol, Xanthan Gum, Carbomer, Tocopherol, Silybum Marianum Fruit Extract, Ceramide EOP.

Apply 2 drops to clean damp skin. Use a.m. and p.m. on its own or blended with moisturizer for maximum results.